Indandatho Yesiqeshana Esimboziwe se-TaC ye-SiC Epitaxy
Indandatho ye-TaC Coated Wafer ye-SiC Epitaxy iyingxenye yenqubo eklanywe ngokunemba eyenzelwe ukuzinzisa izimo zomphetho we-wafer ngesikhathi sokukhula kwe-epitaxial ye-silicon carbide eshisa kakhulu. Yakhiwe nge-graphite ye-isostatic emsulwa kakhulu futhi ivikelwe yi-dense tantalum carbide coating, indandatho ye-wafer inikeza ukuzinza kokushisa okumangalisayo, ukungangeni kwamakhemikhali, kanye nokulawula izinhlayiya ezindaweni ezinolaka ze-SiC CVD kanye ne-MOCVD. Ngokuchaza umngcele wokusabela ozinzile ozungeze i-wafer, isekela ukufana komphetho okuthuthukisiwe, ukwehla kokubekwa kwe-parasitic, kanye nokusebenza okuqhubekayo kwe-epitaxial. Lokhu kuhlanganiswa kwezinto ezithuthukisiwe kanye nobuchwepheshe bokumboza obuqinile kwenza indandatho ye-wafer ibe yisisombululo esithembekile sezinhlelo zokusebenza ze-epitaxy ze-SiC ezikhiqiza kakhulu, ezikhiqizayo. Silangazelela ukuthola umbuzo wakho.
Incazelo
Indandatho ye-TaC Coated Wafer ye-SiC Epitaxy iyingxenye ebalulekile yenqubo eyenzelwe ukuqinisekisa ukuzinza kokushisa kanye namakhemikhali emphethweni we-wafer ngesikhathi sokukhula kwe-silicon carbide epitaxial okushisa okuphezulu. Ezinqubweni ze-SiC CVD kanye ne-MOCVD, izimo zomphetho we-wafer zithinta kakhulu ukufana kokushisa, ukuziphatha kokugeleza kwegesi, kanye nokufakwa kwe-parasitic. Ngokuchaza ngokunembile umngcele wokusabela ozungeze ama-wafer e-SiC, indandatho ye-wafer idlala indima ebalulekile ekuqiniseni indawo yokukhula yendawo. Lokhu kuqinisekisa ukujiya kwe-epitaxial okuhambisanayo, ukusatshalaliswa kwe-doping efanayo, kanye nesivuno esiphezulu somphetho kulo lonke ukukhiqizwa.
Le ngxenye isebenzisa i-graphite e-isostatic emsulwa kakhulu njengezinto zayo ze-substrate, ekhombisa ukuguquguquka okuvelele kokushisa, ubuqotho besakhiwo, kanye nokusebenza kahle ngaphansi kwezimo zenqubo ezimbi kakhulu. Ubuso be-substrate ye-graphite bumbozwe ngokulinganayo ngesendlalelo se-Tantalum Carbide (TaC) esiminyene, okwenza isithiyo esiqinile sokuvikela esinokumelana okungavamile nokugqwala kwamakhemikhali kanye nokuwohloka kokushisa. Ngaphakathi kwendawo edingakalayo ye-SiC epitaxy—esebenza emazingeni okushisa angaphezu kuka-1600 °C ngamagesi asebenzayo aqukethe i-hydrogen nama-halogen—i-Tantalum Carbide Coating icindezela ngempumelelo ukugqwala kwe-graphite, inciphisa ukukhiqizwa kwezinhlayiya, futhi igcina izimo zobuso ezizinzile kuyo yonke imijikelezo yokusebenza ende.
Ngokombono wenqubo, izindandatho ze-wafer ezimbozwe yi-TaC zinegalelo ngqo ekuzinzisweni kwensimu yokushisa emphethweni kanye nokulawulwa kokugeleza kwegesi, kunciphisa ukungalingani okuhlobene nomngcele kanye nokunciphisa ukufakwa kwezinambuzane ezifweni ezizungezile. Ukungangeni kwamakhemikhali kwe-TaC kanye nendawo ephezulu yokuncibilika (3880°C) kuvumela ukuchayeka isikhathi eside ezindaweni zamakhemikhali e-epitaxial ezibolayo ngaphandle kokuwohloka noma ukuhlukanisa, okubalulekile ekugcineni ubuningi obuphansi bokukhubazeka kanye nokusebenza kwenqubo okuphindaphindwayo. Uma kuqhathaniswa nezingxenye ze-SiC ezingamboziwe noma ezivamile, izakhiwo ezimbozwe yi-TaC zandisa kakhulu impilo yesevisi, zithuthukisa ukuhambisana kwenqubo, futhi zinciphisa izindleko eziphelele zobunikazi ekukhiqizweni komthamo.
Njengomhlinzeki ohamba phambili waseShayina wezinqubo ze-SiC epitaxy, ama-TaC Coated Wafer Rings ethu anikeza izixazululo zokuklama ezenziwe ngokwezifiso ezenzelwe izidingo zakho zokukhiqiza ezithile. Silangazelela ngobuqotho ukuba ngumlingani wakho wesikhathi eside eShayina.

I-Tantalum carbide (i-TaC) enamathela esigcemeni se-microscopic
Imininingwane
| Izakhiwo ezibonakalayo ze-TaC coating | |
| Ubuningi | 14.3 (g/cm³) |
| Ukukhipha umoya okukhethekile | 0.3 |
| I-coefficient yokwandisa ukushisa | 6.3*10-6/K |
| Ukuqina (HK) | 2000 HP |
| Resistance | 1 × 10-5 Om*cm |
| Ukuzinza Thermal | <2500 ℃ |
| Usayizi we-graphite uyashintsha | -10 ~ 20um |
| Ukuqina kwe-coating | ≥20um inani elijwayelekile (35um±10um) |
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