I-TaC Coated Rotation Plate
I-TaC Coated Rotation Plate evela ku-Semixlab yakhelwe ngokukhethekile indawo enezinga lokushisa eliphezulu nenamandla amakhemikhali kuzinqubo ze-semiconductor epitaxy kanye ne-CVD. Ifaka i-tantalum carbide (TaC), le ngxenye ihlinzeka ngokuqina okushisayo okukhethekile, ukumelana nokugqwala, nokuzinza kwemishini. I-Semixlab inikeza ukujiya ofanelana nawe, izinto ze-substrate, nokulethwa okusheshayo ukuze kuhlangatshezwane nezidingo ezinembile zemishini yokucubungula i-wafer ethuthukisiwe.
Incazelo
I-Semixlab TaC Coated Rotation Plate yakhelwe izinga lokushisa eliphezulu kanye nezimo ezonakalisayo ngokuvamile okuhlangatshezwana nazo ku-semiconductor epitaxy, CVD, kanye nezinqubo zokukhula kwekristalu. Lawa mapuleti azungezayo adlala indima ebalulekile ekusekeleni abathwali be-wafer noma ama-susceptors ngesikhathi sokujikeleza kwe-substrate eqhubekayo, ukuqinisekisa ukusatshalaliswa kokushisa okufanayo kanye nokubekwa. Ngokusebenzisa i-tantalum carbide (TaC), le ngxenye ifinyelela ukuqina okukhethekile, ukuzinza kwe-thermal, futhi icubungula impilo ende ekufuneni izicelo ze-vacuum kanye ne-high-temperature semiconductor.
Ukwenza Ngokwezifiso Nezinsizakalo Zokusekela ze-Semixlab
● Ukuqina Kokunamathela Ngokwezifiso & Ijometri
Kungakhathaliseki ukuthi ngamapuleti aphendukayo angu-200mm, 300mm, noma enziwe ngokwezifiso, ithimba le-Semixlanb liletha izixazululo ze-TaC eziqondene nejometri eziklanyelwe indawo yenqubo yakho.
● Ukubonisana Ngokukhetha Okubalulekile
Udinga usizo lokunquma phakathi kwama-graphite, SiC, noma ama-quartz substrates? Onjiniyela bethu bayasiza ekukhetheni isisekelo esifanelekile se-TaC yakho enamathelayo.
● I-Prototyping Esheshayo Nezinsizakalo Zeqoqo Elincane
Ilungele i-R&D nokukhiqizwa komshayeli, i-Semixlab isekela ama-oda e-MOQ aphansi anezikhathi zokuhola ezimfushane.
● Usekelo Oluphendulayo Ngemva Kokuthengisa
Kusukela kumhlahlandlela wokufaka ukuya ekulandeleleni ukusebenza kokumboza, ithimba lethu lezobuchwepheshe liqinisekisa ukuthi uthola inani lesikhathi eside nokuthembeka kuzo zonke izingxenye esizilethayo.
Imininingwane
| Izakhiwo ezibonakalayo ze-TaC coating | |
| Ubuningi | 14.3 (g/cm³) |
| Ukukhipha umoya okukhethekile | 0.3 |
| I-coefficient yokwandisa ukushisa | 6.3*10-6/K |
| Ukuqina (HK) | 2000 HP |
| Resistance | 1 × 10-5 Om*cm |
| Ukuzinza Thermal | <2500 ℃ |
| Usayizi we-graphite uyashintsha | -10 ~ 20um |
| Ukuqina kwe-coating | ≥20um inani elijwayelekile (35um±10um) |
Izicelo
● Ukukhula kwe-SiC ne-GaN Epitaxial
● I-Metal Organic Chemical Vapor Deposition (MOCVD)
● I-Low/High Pressure Chemical Vapor Deposition (LPCVD / HPCVD)
● I-Sapphire ne-SiC Crystal Growth Furnaces
● Amakamelo Okucubungula Amafilimu Amancane Athuthukile

isithando somlilo se-silicon carbide epitaxial ukukhula kanye nezinsiza ezibalulekile
Njengomkhiqizi ohamba phambili we-TaC Coated Rotation Plate kanye nomphakeli e-China, Ngobuchwepheshe obujulile bemboni, ubuchwepheshe bokunemba okunembayo, nokuzibophezela okuqinile ekusungulweni okusha, i-Semixlab iletha izingxenye ezimbozwe nge-TaC ezihlangabezana nezindinganiso eziqinile zomkhakha we-semiconductor. Sithemba ngobuqotho ukuba nguzakwethu wesikhathi eside e-China.
Competitive Advantage
Izakhiwo Zomzimba Ezibalulekile Nezinzuzo Zokusebenza
1. I-Thermal Stability Eyingqayizivele
I-TaC inephuzu lokuncibilika elingaphezu kuka-3880°C, okwenza ipuleti elijikijelwayo lizinze ngendlela engavamile phakathi nokucubungula isikhathi eside kwezinga lokushisa eliphezulu.
Lokhu kuqina kwe-thermal kubalulekile ezinhlelweni ze-MOCVD, LPCVD, kanye ne-PVD, lapho ama-substrates echayeka emazingeni okushisa aguquguqukayo nadlulele.
2. Superior Chemical Inertness
I-Tantalum carbide ifaka amakhemikhali kumagesi amaningi anolaka kanye nemikhiqizo ebolayo, ehlanganisa i-chlorine, i-hydrogen, nama-halogenated compounds.
Lokhu kumelana kwamakhemikhali kuqinisekisa ukusebenza kwesikhathi eside kanye nezingozi ezincishisiwe zokungcola, okubalulekile ku-SiC epitaxy, i-GaN deposition, nokukhula kwefilimu ye-oxide.
3. Ukuqina Okuvelele & Ukumelana Nokuguguleka
Ngokuqina kwe-Vickers ngaphezu kuka-2000 HV, indawo embozwe yi-TaC imelana nokuguga komshini okuvela ezindleleni ezijikelezayo nomthelela wezinhlayiyana.
Inzuzo ihumushela empilweni enwetshiwe yesevisi kanye nemvamisa ephansi yokushintshanisa, ukunciphisa isikhathi sokulungiswa kokukhiqizwa kwe-semiconductor.
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4. Ukufana Okuhle Kakhulu Kokunamathela nokunamathela
Inqubo yokuhlanganisa ye-CVD yokuphathelene ye-Semixlab iqinisekisa izendlalelo ze-TaC eziminyene, ezifanayo, nezinamathela kahle, ezibalulekile emiphumeleni yenqubo engashintshi kanye nokukhiqizwa kwezinhlayiyana okuncane.
Imisebenzi Yethu

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