Silicon Carbide esithandweni somlilo
| Indawo Origin: | China |
| Igama Brand: | I-Semixlab |
| Inombolo Model: | I-SCFT-01 |
| Certification: | ISO9001 |
| Ubuncane Order Ubuningi: | 1 Iyunithi |
| Price: | Othintana naye ukuze uthole ikhotheshini eyenziwe ngokwezifiso |
| Okufakiwe Yokuxhumana: | Igwebu Le-Anti-Static +Ibhokisi lePlywood(Kungenziwa ngokwezifiso) |
| Delivery Isikhathi: | Izinsuku ezingama-60-90 ngemuva kokuqinisekiswa kwe-oda |
| Inkokhelo Imigomo: | T / T |
| Supply Amandla: | Amayunithi ayi-100/Inyanga |
Incazelo
I-Semixlab inikeza i-Ultra-high purity SiC furnace system, izixazululo zensimu eshisayo ye-semiconductor-grade enobumsulwa be-coating engu-99.9999% kanye nokulethwa okuphelele komugqa.
Isiphakamiso senani elibalulekile
Nikeza ngendawo eshisayo engangcoliswanga ngokuphelele yokwenziwa kwe-wafer: 99.9% ukuhlanzeka kwe-SiC kwe-substrate + 99.9999% ukuhlanzeka kwe-CVD enamathelayo, kuhlanganiswe nesistimu ephelele ye-SiC cantilever paddle & wafer boat system, ukuze kuzuzwe ukungcola okuyiziro zensimbi ekamelweni lenqubo.
Amagama ahlukene emikhiqizo:
Izinga lokushisa eliphezulu leshubhu leSiC somlilo;ishubhu le-silicon carbide;Ishubhu ye-SiC emsulwa;Ishubhu le-Silicon carbide lesithando sokusabalalisa;Ishubhu ye-silicon carbide yokusabalalisa &inqubo ye-LPCVD;Ishubhu ye-SiC ye-RTP,ishubhu ye-SiC yokukhipha i-oxidation
Imininingwane ebalulekile:
Ubumsulwa bezinto ezibonakalayo: I-base material i-silicon carbide enobumsulwa obungaphezu kuka-99.9%, futhi ubumsulwa ngemva kokumbozwa kwe-CVD bungaphezu kuka-99.9999% (ibanga le-6N).
Ukusebenza okushisayo: Izinga lokushisa eliphezulu lokusebenza 1650℃ (isikhathi eside), i-coefficient yokunweba okushisayo: 4.6×10⁻⁶/℃, ukufana endaweni yokushisa engashintshi: ±1.5℃ (1200℃);
Amandla omshini: Amandla okugoba 450Mpa(ezinga lokushisa legumbi).

Imininingwane
| Izakhiwo ezibonakalayo ze-Sintered Silicon Carbide | |
| Property | Value ejwayelekile |
| Ukwakhiwa kwamakhemikhali | I-SiC>99.9% |
| Ukuxineka kwenqwaba | >3.07 g/cm³ |
| I-porosity ebonakalayoI-porosity esobala | |
| I-modulus yokuqhekeka ku-20 ℃ | 270 MPa |
| I-modulus yokuqhekeka ku-1200 ℃ | 290 MPa |
| Ukuqina ku-20 ℃ | 2400 Kg/mm² |
| Ukuqina kokuphuka ku-20% | 3.3 MPa · m1/2 |
| I-Thermal Conductivity ku-1200 ℃ | 45 w/m .K |
| Ukunwetshwa kwe-thermal ku-20-1200 ℃ | 4.6 × 10-6/℃ |
| Izinga lokushisa eliphezulu | 1650 ℃ (isikhathi eside) |
| Ukumelana nokushaqeka okushisayo ku-1200 ℃ | Good |
Izicelo
Ukusetshenziswa okuyinhloko
Inkampani yenethiwekhi eshisayo
Sungula inkambu yokushisa eqinile nefanayo phakathi kwebanga lika-1200℃ ukuya ku-1650℃ (umehluko wezinga lokushisa endaweni yokushisa engashintshi ngu-≤±1.5℃)
Qinisekisa izimo ze-thermodynamic zezinqubo ezifana nokusabalalisa, i-oxidation kanye ne-annealing.
Umgoqo wokuhlukanisa ukungcola
Vimba ukusakazeka kwama-ion ensimbi (afana ne-Fe/Ni/Cu, njll.) ngezinto ezihlanzeke kakhulu (njenge-SiC).
Vimbela ukungcola phakathi kwamagesi enqubo nendawo yangaphandle.
Ishaneli yegesi yokucubungula
Lawula ngokuqondile isiqondiso sokugeleza nokusatshalaliswa kwamagesi asabelayo (afana ne-O₂/N₂/SiH₄, njll.)
Zuza ukusabela okufanayo kwesigaba segesi endaweni eyisicwecwana (efana nokukhula kwe-SiO₂).
I-Photovoltaic coating: Sekela i-TOPCon/HJT cell PECVD inqubo yokuthutha i-wafer.
Izimo zohlelo lokusebenza
● I-Epitaxy
● I-Oxidation/Ukusabalalisa
● Inqubo ye-LPCVD/PECVD
● Ukufakwa kwama-semiconductors ayinhlanganisela ye-III-V
Izixazululo zamaphuzu obuhlungu bezimboni
Izixazululo zethu zibhekana nezinhlungu zamakhasimende ethu:
1. Ukungcoliswa kwezinhlayiyana zenqubo yokushisa okuphezulu: I-6N yokumboza ivimba imvula yokungcola.
Ukushintshwa njalo kwe-SiC ezingxenyeni ze-quartz kukhulisa ukumelana nokugqwala izikhathi eziyi-8.
2. Idizayini engaguquguquki ye-CTE yokungezwani kokwanda kokushisa kwezingxenye zensimu eshisayo kulo lonke uchungechunge lwezinto ze-SiC.
3. Ukwelashwa kwendawo ecwebezelwe kakhulu yokungcoliswa kwensimbi ngemuva kwe-wafer (Ra 0.2μm).
Competitive Advantage
Izinzuzo eziyinhloko zokucaciswa kobuchwepheshe bengxenye:
1. I-SiC furnace tube - Isisekelo sokuhlanzeka kwempahla: 99.9% sintered silicon carbide
▶ Ukumelana nokushaqeka okushisayo kuthuthukiswa izikhathi ezi-3 (ukupholisa ngokushesha> 1600℃)
I-coefficient yokunwetshwa kwe-thermal iphansi njengo-4.6×10⁻⁶/℃
I-Nanoscale coating - CVD deposition ye-6N-grade high-purity SiC (99.9999%)
▶ Ukuvimbela ukusabalalisa kwezinsimbi ezifana ne-Fe ne-Ni
▶ Ubulukhuni bobuso Ra <0.5μm
2. I-SiC wafer Boat - Ihambisana namawafa angama-intshi angu-12
- Idizayini enezingqimba eziningi ezithwala umthwalo
▶ 100% ukufanisa okushisayo namashubhu esithandweni somlilo
Izinga lokungcoliswa kwe-wafer lingaphansi kuka-0.01 ppb
3. I-Cantilever paddle system - isostatic graphite substrate +SiC coating
- Ukuqondanisa okuzenzakalelayo ±0.1mm
▶ Impilo yokumelana ne-creep> izikhathi eziyi-100,000
Ukudlidliza kokudlulisela kungaphansi kuka-5μm
Izithombe ezinhle kakhulu zobuchwepheshe eziphazamisayo
I-Purity Revolution
Uhlelo lokuvikela olunamazinga amabili
Isendlalelo sesisekelo singu-99.9% SiC → ukuze kwakhiwe uhlaka lwamandla aphezulu
I-CVD-SiC yeleveli engu-6N esendlalelo esisebenzayo yenza izinga le-athomu elivalwe kahle
umgoqo
Ukulawula ukungcola: I-Na/K <0.1ppm, izinsimbi ezisindayo <5ppb, ezihlangabezana nezidingo zezinqubo ezingaphansi kuka-28nm
Inzuzo yesistimu ye-synergy
● Ukufana kwenkambu eshisayo: Idizayini yokuhlanganisa eshisayo kathathu yeshubhu lomlilo + isikebhe esilucwecwana + i-paddle blade, umehluko wezinga lokushisa endaweni yokushisa engashintshi (> 1200℃) ngu-≤±1.5℃
● Ukuphindwa kabili kwesikhathi sokuphila: Isixazululo sonke sinweba ubude bempilo ngo-40% uma kuqhathaniswa nesistimu ehlanganisiwe, i-MTBA idlula amahora angu-8,000

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