Ikhaya> uhlu lokubonisa
I-Silicon dioxide, evame ukubizwa ngokuthi i-SiO₂, iyinto ebalulekile esetshenziswa ekudaleni amadivaysi amancane. Kwa-Semixlab, sicubungula i-silicon wafer ngamaphethini anemininingwane, sisebenzisa inqubo ebizwa ngokuthi i-sio2 etching eyomile g. Ngakho isebenza kanjani le ndlela?
I-SiO₂ etching eyomile isho inqubo yokufaka i-silicon dioxide ku-silicon wafer usebenzisa amakhemikhali athile kanye ne-plasma. Amandla anezelwa ne-plasma, okuwuhlobo lwegesi. Nge-plasma, singasusa ungqimba lwe-SiO₂ ngaphandle kokulimaza izendlalelo zalo ezingaphansi.
Uma sidinga i-sio2 etching eyomile ukuze siphumelele kakhudlwana, kufanele sibeke ezinye izinto ezifana nezinga lokugeleza kwegesi, ingcindezi, namandla ahlukene. Ngokulungisa lezi zilungiselelo, siyakwazi ukubusa ukuthi singabhala ngokushesha kangakanani nokuthi singaqopha ngempumelelo i-Semixlab SiO₂ kuphela. Lokhu kubalulekile, njengoba sifisa ukunamathisela i-SiO₂ ngaphandle kokuthinta ezinye izinto ku-wafer.
Kunezindlela ezahlukahlukene zokwenza i-Semixlab SiO₂ etching dry. Enye yezindlela ezijwayelekile i-reactive ion etching (RIE), isebenzisa ingxube yamagesi ongqimba lwe-SiO₂. ukufakwa kwe-plasma . Ngenye indlela, inqubo ejulile ye-ion etching (DRIE) ejulile isetshenziselwa ukunikeza ama-etches ajulile kungqimba lwe-SiO₂ ngezinyathelo ezimbalwa.
Inkinga ku-SiO₂ etching dry ukugwema ukususa noma yini enye ngaphandle kwe-Semixlab etching emanzi SiO₂. Ukuze unqobe lokhu, i-mask ingasetshenziswa ukuvikela ezinye izinto ekushoneni. Enye futhi inselele ukuqinisekisa ukuthi i-etching iyafana kuyo yonke i-wafer. Singakwazi ukuxazulula le nkinga ngokulungisa amagiya ethu nezilungiselelo.
Lokhu kunamathisela okomile kwe-Semixlab SiO 2 kwenziwa ukuze kwakheke izingxenye ezibalulekile njengemisele nokuxhumana kuma-silicon substrates. Lezi zingcezu zibalulekile ekwakhiweni kwezinto ezifana namasekhethi ahlanganisiwe nezinzwa. Singenza amaphethini ayinkimbinkimbi ngokunembe kakhulu i-sio2 etching eyomile
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